Carl Zeiss and ASML Propose Hyper-NA EUV Lithography
Researchers from Carl Zeiss SMT and ASML have introduced a new approach to manufacturing chips: Hyper-NA EUV lithography. This system targets a numerical aperture of 0.75 or higher, pushing well past today’s High-NA extreme ultraviolet machines capped at 0.55. Their new paper breaks down both the optical challenges and the advantages—mainly, even sharper chip features. Still, it’s a research concept, not a product pipeline yet.
- Hyper-NA targets a 0.75 numerical aperture or greater
- Current leading-edge lithography stops at 0.55 NA
- Published work is by Carl Zeiss SMT and ASML researchers
- Paper covers optics, resolution, and ecosystem requirements
- Technology remains at a research stage
Sources covering this
In this story
More in Chips
SpaceX in talks to finance $40 billion Nvidia chip order
SpaceX is working with Apollo Global Management and several banks to line up $40 billion in financing for an enormous order of Nvidia AI…
Intel confirms continued partnership with Musk's Terafab
Intel will remain involved with Elon Musk's Terafab chip manufacturing venture, even as Musk discusses a possible sublease for TSMC to…
Samsung's HBM4E memory passes NVIDIA qualification tests
Samsung's new 12-layer HBM4E high-bandwidth memory has reportedly passed qualification testing at NVIDIA, clearing a key technical…
Experts debate thermal challenges in photonic AI chips
Industry leaders say AI chips using photonics—light-based data movement—could speed up data processing and cut energy use, but new heat…